63 research outputs found

    Development Of Si02 Thin Film On singlecrystal Sic By anodic oxidation technique.

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    Anodic silicon dioxide (Si02) thin film is growth on p- and n-type silicon (Si) and p-type 4H-silicon carbide (SiC) substrate with the thickness ranging from 50-130 nm. Filem nipis Si02 tersadur anod telah ditumbuhkankan di atas substrat silikon (Si) jenis p dan n serta silikon karbida jenis-p dengan ketebalan dalam julat 50-130

    Synthesis Of Cobalt/Gold Bimetallic Hollow Microspheres And Its Optical Properties

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    Galvanic replacement reaction is a very simple and effective method to prepare the particles with hollow interior [1]

    Formation of ZnO nanorods via low temperature hydrothermal method for enzymatic glucose sensor

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    In this study, zinc oxide (ZnO) nanorod arrays were synthesized using a simple hydrothermal reaction on a ZnO seeds/ITO substrate and applied for the fabrication of enzymatic glucose sensor. ZnO nanorod matrix provided a favourable environment for the immobilization of glucose oxidase (GOx) and introduced a shuttling way for electronic communication between GOx and electrode. The performance of different aspect ratio of ZnO nanorods that was produced by varying hydrothermal reaction time was studied. The aspect ratio of ZnO influenced the GOx enzyme immobilization. The morphology and structure of prepared ZnO nanorods were characterized by employing scanning electron microscopy (SEM), and X-ray powder diffraction (XRD). Electrochemical measurements of the sensor showed a reproducible sensitivity of 2.06 μA/cm2mM for ZnO matrix grown for 4 h with the aspect ratio of 8.0

    Study of ITO Glass Electrode Modified with Iron Oxide Nanoparticles and Nafion for Glucose Biosensor Application

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    AbstractIn this study, we report the fabrication of the indium tin oxide (ITO) glass electrode modified with iron oxide nanoparticles (IONPs) and nafion for glucose biosensor applications. The IONPs was synthesized using the precipitation method and functionalized with citric acid (CA) to provide hydrophilic surface and functional group for glucose oxidase (GOx) enzyme immobilization. The structural and morphological studies of CA-IONPs were characterized using X-ray diffractometer (XRD) and transmission electron microscope (TEM). The size of the IONPs measured from TEM image was ∼17nm. The bioelectrode designated as Nafion/GOx/CA-IONPs/ITO was developed by drop casting of the CA-IONPs, GOx and nafion on the ITO glass. The Nafion/GOx/CA-IONPs/ITO bioelectrode showed good electrochemical performance for glucose detection. The functionalized CA-IONPs acted as the catalyst and help to improve the electron transfer rate between GOx and ITO electrode. In addition, thin nafion film was coated on the electrode to prevent interference and improve chemical stability. The Nafion/GOx/CA-IONPs/ITO bioelectrode showed high sensitivity of 70.1μAmM-1cm-2 for the linear range of 1.0-8.0mM glucose concentrations

    Etching Effect On The Formation Of Silicon Nanowire Transistor Patterned By AFM Lithography.

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    Anisotropic etching of silicon has been widely used in fabrication of MEMS devices for many years. In this work, TMAH and KOH with IPA are used to etch silicon nanowire transistor patterns

    High-K LaCeO For Passivation Of Si Substrate

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    High dielectric constant rare earth lanthanum cerium oxide (LaCeO) films have been studied as the passivation layers for silicon substrate. Effects of post-deposition annealing time (15, 30, and 45 min) was carried out at 700ºC towards structural and morphological characteristics of the films. As the annealing time was increased from 15 to 45 min, a shift in the diffraction angles, peak intensity, and peak width obtained from high resolution X-ray diffraction happened and resulted in changes in term of crystallite size and lattice strain present in the films. Corresponding influence on the film roughness has been also explored. A functional metal-oxide-semiconductor (MOS) based capacitor using the LaCeO film was fabricated in order to study current-voltage characteristics of the sampl

    Surface oxidation epitaxy of (100) <001> nickel and nickel-based alloys

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